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Nano-patterning of silica material by Nano-Imprint

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I. Gozhyk - J. Teisseire

Patterning of surfaces at the sub-micrometer scale is a key factor for the emergence of a wide variety of applications from physics to biology. In photonics, nanostructures can provide new or enhance existing properties: e.g. antireflection coating or polarizers can be obtained.

Nano Imprint Lithography (NIL) has emerged as a promising technique to replicate nanostructures for surface functionalization. It allows the pattern transfer from a master mold to a thin film. In the laboratory, we have developed a one-step, fast and potential low cost process to make silica-like nanostructures by combining sol-gel chemistry and thermal nanoimprint. This technique allows for the formation of pattern with periods ranking from 100 nm to 20 µm with aspect ratio greater than 4. After a suitable thermal annealing, pure silica structured layer are obtained.

Our interests focus on the relation between rheological properties, material chemistry and ability to be embossed. We further develop the synthesis of highly functional structured surface such as porous layer or luminescent materials


  • A. Letailleur (PhD 2009-2012)
  • C. Peroz (PostDoc 2007-2008)


  • François Ribot and Cédric Boissière, LCMCP, Paris,’’ for the material properties and synthesis.’’
  • Gilles Lerondel, LNIO, Troyes ’’for the optical chracterization of the obtained surfaces’’
  • NaPaNIL’’A project devoted to the application of nanoimprint lithography to the elaboration of large scale optical devices.’’
  • Cécile Gourgon, LTM, Grenobles

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